X-ray absorption near edge structure investigation of vanadium-doped ZnO thin films

Abstract X-ray absorption near edge structure spectroscopy has been used to investigate the electronic and atomic structure of vanadium-doped ZnO thin films obtained by reactive plasma. The results show no sign of metallic clustering of Vatoms, +4 oxidation state of V, 4-fold coordination of Zn in t...

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محفوظ في:
التفاصيل البيبلوغرافية
المؤلف الرئيسي: Faiz, M. (author)
مؤلفون آخرون: Tabet, N. (author), Mekki, A. (author), Mun, B.S. (author), Hussain, Z. (author), unknown (author)
التنسيق: article
منشور في: 2020
الموضوعات:
الوصول للمادة أونلاين:https://eprints.kfupm.edu.sa/id/eprint/523/1/FaizTabetetal.pdf
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الوصف
الملخص:Abstract X-ray absorption near edge structure spectroscopy has been used to investigate the electronic and atomic structure of vanadium-doped ZnO thin films obtained by reactive plasma. The results show no sign of metallic clustering of Vatoms, +4 oxidation state of V, 4-fold coordination of Zn in the films, and a secondary phase (possibly VO2) formation at 15% V doping. O K edge spectra show V 3d–O 2p and Zn 4d–O 2p hybridization, and suggest that V4+ acts as electron donor that fills the σ* band. © 2006 Elsevier B.V. All rights reserved. Keywords: ZnO; XANES; Vanadium doping; Thin films; DC-sputtering