Optoelectronic properties of highly porous silver oxide thin film
<p dir="ltr">In this paper, we report oxidation time effect on highly porous silver oxide nanowires thin films fabricated using ultrasonic spray pyrolysis and oxygen plasma etching method. The NW’s morphological, electrical, and optical properties were investigated under different pl...
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2021
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| _version_ | 1864513505691959296 |
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| author | Ahmad Al-Sarraj (17151007) |
| author2 | Khaled M. Saoud (16876017) Abdelaziz Elmel (19645948) Said Mansour (8697699) Yousef Haik (2610628) |
| author2_role | author author author author |
| author_facet | Ahmad Al-Sarraj (17151007) Khaled M. Saoud (16876017) Abdelaziz Elmel (19645948) Said Mansour (8697699) Yousef Haik (2610628) |
| author_role | author |
| dc.creator.none.fl_str_mv | Ahmad Al-Sarraj (17151007) Khaled M. Saoud (16876017) Abdelaziz Elmel (19645948) Said Mansour (8697699) Yousef Haik (2610628) |
| dc.date.none.fl_str_mv | 2021-01-07T03:00:00Z |
| dc.identifier.none.fl_str_mv | 10.1007/s42452-020-04091-1 |
| dc.relation.none.fl_str_mv | https://figshare.com/articles/journal_contribution/Optoelectronic_properties_of_highly_porous_silver_oxide_thin_film/26983897 |
| dc.rights.none.fl_str_mv | CC BY 4.0 info:eu-repo/semantics/openAccess |
| dc.subject.none.fl_str_mv | Engineering Materials engineering Nanotechnology Ultrasonic spray pyrolysis Oxygen plasma etching Silver oxide film Optical properties Electrical properties |
| dc.title.none.fl_str_mv | Optoelectronic properties of highly porous silver oxide thin film |
| dc.type.none.fl_str_mv | Text Journal contribution info:eu-repo/semantics/publishedVersion text contribution to journal |
| description | <p dir="ltr">In this paper, we report oxidation time effect on highly porous silver oxide nanowires thin films fabricated using ultrasonic spray pyrolysis and oxygen plasma etching method. The NW’s morphological, electrical, and optical properties were investigated under different plasma etching periods and the number of deposition cycles. The increase of plasma etching and oxidation time increases the surface roughness of the Ag NWs until it fused to form a porous thin film of silver oxide. AgNWs based thin films were characterized using X-ray diffraction, scanning electron microscope, transmission electron microscope, X-ray photoemission spectroscopy, and UV–Vis spectroscopy techniques. The obtained results indicate the formation of mixed mesoporous Ag<sub>2</sub>O and AgO NW thin films. The Ag<sub>2</sub>O phase of silver oxide appears after 300 s of oxidation under the same conditions, while the optical transparency of the thin film decreases as plasma etching time increases. The sheet resistance of the final film is influenced by the oxidation time and the plasma application periodicity.</p><h2>Other Information</h2><p dir="ltr">Published in: SN Applied Sciences<br>License: <a href="https://creativecommons.org/licenses/by/4.0" target="_blank">https://creativecommons.org/licenses/by/4.0</a><br>See article on publisher's website: <a href="https://dx.doi.org/10.1007/s42452-020-04091-1" target="_blank">https://dx.doi.org/10.1007/s42452-020-04091-1</a></p> |
| eu_rights_str_mv | openAccess |
| id | Manara2_2886c9094e80b2a9024f659df654b253 |
| identifier_str_mv | 10.1007/s42452-020-04091-1 |
| network_acronym_str | Manara2 |
| network_name_str | Manara2 |
| oai_identifier_str | oai:figshare.com:article/26983897 |
| publishDate | 2021 |
| repository.mail.fl_str_mv | |
| repository.name.fl_str_mv | |
| repository_id_str | |
| rights_invalid_str_mv | CC BY 4.0 |
| spelling | Optoelectronic properties of highly porous silver oxide thin filmAhmad Al-Sarraj (17151007)Khaled M. Saoud (16876017)Abdelaziz Elmel (19645948)Said Mansour (8697699)Yousef Haik (2610628)EngineeringMaterials engineeringNanotechnologyUltrasonic spray pyrolysisOxygen plasma etchingSilver oxide filmOptical propertiesElectrical properties<p dir="ltr">In this paper, we report oxidation time effect on highly porous silver oxide nanowires thin films fabricated using ultrasonic spray pyrolysis and oxygen plasma etching method. The NW’s morphological, electrical, and optical properties were investigated under different plasma etching periods and the number of deposition cycles. The increase of plasma etching and oxidation time increases the surface roughness of the Ag NWs until it fused to form a porous thin film of silver oxide. AgNWs based thin films were characterized using X-ray diffraction, scanning electron microscope, transmission electron microscope, X-ray photoemission spectroscopy, and UV–Vis spectroscopy techniques. The obtained results indicate the formation of mixed mesoporous Ag<sub>2</sub>O and AgO NW thin films. The Ag<sub>2</sub>O phase of silver oxide appears after 300 s of oxidation under the same conditions, while the optical transparency of the thin film decreases as plasma etching time increases. The sheet resistance of the final film is influenced by the oxidation time and the plasma application periodicity.</p><h2>Other Information</h2><p dir="ltr">Published in: SN Applied Sciences<br>License: <a href="https://creativecommons.org/licenses/by/4.0" target="_blank">https://creativecommons.org/licenses/by/4.0</a><br>See article on publisher's website: <a href="https://dx.doi.org/10.1007/s42452-020-04091-1" target="_blank">https://dx.doi.org/10.1007/s42452-020-04091-1</a></p>2021-01-07T03:00:00ZTextJournal contributioninfo:eu-repo/semantics/publishedVersiontextcontribution to journal10.1007/s42452-020-04091-1https://figshare.com/articles/journal_contribution/Optoelectronic_properties_of_highly_porous_silver_oxide_thin_film/26983897CC BY 4.0info:eu-repo/semantics/openAccessoai:figshare.com:article/269838972021-01-07T03:00:00Z |
| spellingShingle | Optoelectronic properties of highly porous silver oxide thin film Ahmad Al-Sarraj (17151007) Engineering Materials engineering Nanotechnology Ultrasonic spray pyrolysis Oxygen plasma etching Silver oxide film Optical properties Electrical properties |
| status_str | publishedVersion |
| title | Optoelectronic properties of highly porous silver oxide thin film |
| title_full | Optoelectronic properties of highly porous silver oxide thin film |
| title_fullStr | Optoelectronic properties of highly porous silver oxide thin film |
| title_full_unstemmed | Optoelectronic properties of highly porous silver oxide thin film |
| title_short | Optoelectronic properties of highly porous silver oxide thin film |
| title_sort | Optoelectronic properties of highly porous silver oxide thin film |
| topic | Engineering Materials engineering Nanotechnology Ultrasonic spray pyrolysis Oxygen plasma etching Silver oxide film Optical properties Electrical properties |