Study of wide bandgap SnO<sub>x</sub> thin films grown by a reactive magnetron sputtering via a two-step method

<p dir="ltr">In the present work, we report on the microstructural and optoelectronic properties of SnO<sub>x</sub> thin films deposited by a reactive radio frequency magnetron sputtering. After SnO<sub>x</sub> growth by sputtering under O<sub>2</sub&...

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محفوظ في:
التفاصيل البيبلوغرافية
المؤلف الرئيسي: Y. Zakaria (17886725) (author)
مؤلفون آخرون: B. Aïssa (17886728) (author), T. Fix (7592447) (author), S. Ahzi (17886731) (author), A. Samara (18300817) (author), S. Mansour (7211648) (author), A. Slaoui (1786944) (author)
منشور في: 2022
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_version_ 1864513512757264384
author Y. Zakaria (17886725)
author2 B. Aïssa (17886728)
T. Fix (7592447)
S. Ahzi (17886731)
A. Samara (18300817)
S. Mansour (7211648)
A. Slaoui (1786944)
author2_role author
author
author
author
author
author
author_facet Y. Zakaria (17886725)
B. Aïssa (17886728)
T. Fix (7592447)
S. Ahzi (17886731)
A. Samara (18300817)
S. Mansour (7211648)
A. Slaoui (1786944)
author_role author
dc.creator.none.fl_str_mv Y. Zakaria (17886725)
B. Aïssa (17886728)
T. Fix (7592447)
S. Ahzi (17886731)
A. Samara (18300817)
S. Mansour (7211648)
A. Slaoui (1786944)
dc.date.none.fl_str_mv 2022-09-12T06:00:00Z
dc.identifier.none.fl_str_mv 10.1038/s41598-022-19270-w
dc.relation.none.fl_str_mv https://figshare.com/articles/journal_contribution/Study_of_wide_bandgap_SnO_sub_x_sub_thin_films_grown_by_a_reactive_magnetron_sputtering_via_a_two-step_method/26021038
dc.rights.none.fl_str_mv CC BY 4.0
info:eu-repo/semantics/openAccess
dc.subject.none.fl_str_mv Engineering
Fluid mechanics and thermal engineering
Materials engineering
Transparent conductive oxides (TCOs)
Solar cells
Light-emitting diodes (LEDs)
Flat panel displays
Tin oxide (SnOx)
Gas sensors
Electrical conductivity
dc.title.none.fl_str_mv Study of wide bandgap SnO<sub>x</sub> thin films grown by a reactive magnetron sputtering via a two-step method
dc.type.none.fl_str_mv Text
Journal contribution
info:eu-repo/semantics/publishedVersion
text
contribution to journal
description <p dir="ltr">In the present work, we report on the microstructural and optoelectronic properties of SnO<sub>x</sub> thin films deposited by a reactive radio frequency magnetron sputtering. After SnO<sub>x</sub> growth by sputtering under O<sub>2</sub>/Ar flow, we have used three different treatment methods, namely (1) as deposited films under O<sub>2</sub>/Ar, (2) vacuum annealed films ex-situ, and (3) air annealed films ex-situ. Effects of the O<sub>2</sub>/Ar ratios and the growth temperature were investigated for each treatment method. We have thoroughly investigated the structural, optical, electrical and morphology of the different films by several advanced techniques. The best compromise between electrical conductivity and optical transmission for the use of these SnO<sub>x</sub> films as an n-type TCO was the conditions O<sub>2</sub>/Ar = 1.5% during the growth process, at 250 °C, followed by a vacuum post thermal annealing performed at 5 × 10<sup>–4</sup> Torr. Our results pointed out clear correlations between the growth conditions, the microstructural and optoelectronic properties, where highly electrically conductive films were found to be associated to larger grains size microstructure. Effects of O<sub>2</sub>/Ar flow and the thermal annealing process were also analysed and discussed thoroughly.</p><h2>Other Information</h2><p dir="ltr">Published in: Scientific Reports<br>License: <a href="https://creativecommons.org/licenses/by/4.0" target="_blank">https://creativecommons.org/licenses/by/4.0</a><br>See article on publisher's website: <a href="https://dx.doi.org/10.1038/s41598-022-19270-w" target="_blank">https://dx.doi.org/10.1038/s41598-022-19270-w</a></p><p dir="ltr">Additional institutions affiliated with: Core Labs - QEERI</p>
eu_rights_str_mv openAccess
id Manara2_7c0b426abf8b9dec4920fc3e7d68fffc
identifier_str_mv 10.1038/s41598-022-19270-w
network_acronym_str Manara2
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oai_identifier_str oai:figshare.com:article/26021038
publishDate 2022
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spelling Study of wide bandgap SnO<sub>x</sub> thin films grown by a reactive magnetron sputtering via a two-step methodY. Zakaria (17886725)B. Aïssa (17886728)T. Fix (7592447)S. Ahzi (17886731)A. Samara (18300817)S. Mansour (7211648)A. Slaoui (1786944)EngineeringFluid mechanics and thermal engineeringMaterials engineeringTransparent conductive oxides (TCOs)Solar cellsLight-emitting diodes (LEDs)Flat panel displaysTin oxide (SnOx)Gas sensorsElectrical conductivity<p dir="ltr">In the present work, we report on the microstructural and optoelectronic properties of SnO<sub>x</sub> thin films deposited by a reactive radio frequency magnetron sputtering. After SnO<sub>x</sub> growth by sputtering under O<sub>2</sub>/Ar flow, we have used three different treatment methods, namely (1) as deposited films under O<sub>2</sub>/Ar, (2) vacuum annealed films ex-situ, and (3) air annealed films ex-situ. Effects of the O<sub>2</sub>/Ar ratios and the growth temperature were investigated for each treatment method. We have thoroughly investigated the structural, optical, electrical and morphology of the different films by several advanced techniques. The best compromise between electrical conductivity and optical transmission for the use of these SnO<sub>x</sub> films as an n-type TCO was the conditions O<sub>2</sub>/Ar = 1.5% during the growth process, at 250 °C, followed by a vacuum post thermal annealing performed at 5 × 10<sup>–4</sup> Torr. Our results pointed out clear correlations between the growth conditions, the microstructural and optoelectronic properties, where highly electrically conductive films were found to be associated to larger grains size microstructure. Effects of O<sub>2</sub>/Ar flow and the thermal annealing process were also analysed and discussed thoroughly.</p><h2>Other Information</h2><p dir="ltr">Published in: Scientific Reports<br>License: <a href="https://creativecommons.org/licenses/by/4.0" target="_blank">https://creativecommons.org/licenses/by/4.0</a><br>See article on publisher's website: <a href="https://dx.doi.org/10.1038/s41598-022-19270-w" target="_blank">https://dx.doi.org/10.1038/s41598-022-19270-w</a></p><p dir="ltr">Additional institutions affiliated with: Core Labs - QEERI</p>2022-09-12T06:00:00ZTextJournal contributioninfo:eu-repo/semantics/publishedVersiontextcontribution to journal10.1038/s41598-022-19270-whttps://figshare.com/articles/journal_contribution/Study_of_wide_bandgap_SnO_sub_x_sub_thin_films_grown_by_a_reactive_magnetron_sputtering_via_a_two-step_method/26021038CC BY 4.0info:eu-repo/semantics/openAccessoai:figshare.com:article/260210382022-09-12T06:00:00Z
spellingShingle Study of wide bandgap SnO<sub>x</sub> thin films grown by a reactive magnetron sputtering via a two-step method
Y. Zakaria (17886725)
Engineering
Fluid mechanics and thermal engineering
Materials engineering
Transparent conductive oxides (TCOs)
Solar cells
Light-emitting diodes (LEDs)
Flat panel displays
Tin oxide (SnOx)
Gas sensors
Electrical conductivity
status_str publishedVersion
title Study of wide bandgap SnO<sub>x</sub> thin films grown by a reactive magnetron sputtering via a two-step method
title_full Study of wide bandgap SnO<sub>x</sub> thin films grown by a reactive magnetron sputtering via a two-step method
title_fullStr Study of wide bandgap SnO<sub>x</sub> thin films grown by a reactive magnetron sputtering via a two-step method
title_full_unstemmed Study of wide bandgap SnO<sub>x</sub> thin films grown by a reactive magnetron sputtering via a two-step method
title_short Study of wide bandgap SnO<sub>x</sub> thin films grown by a reactive magnetron sputtering via a two-step method
title_sort Study of wide bandgap SnO<sub>x</sub> thin films grown by a reactive magnetron sputtering via a two-step method
topic Engineering
Fluid mechanics and thermal engineering
Materials engineering
Transparent conductive oxides (TCOs)
Solar cells
Light-emitting diodes (LEDs)
Flat panel displays
Tin oxide (SnOx)
Gas sensors
Electrical conductivity