Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated (Tridecafluoro-1,1,2,2-tetrahydrooctyl)-1- dimethylchlorosilane Analyzed by XPS
Silane monolayers on silica, prepared from mono-, di-, and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di- and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon...
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| Other Authors: | , , , |
| Format: | article |
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2004
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| Online Access: | http://hdl.handle.net/11073/21333 |
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| Summary: | Silane monolayers on silica, prepared from mono-, di-, and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di- and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon reaction with water. Typically, an organic solvent is used when depositing a silane monolayer. Here we show XPS spectra of monolayers of (Tridecafluoro-1,1,2,2-tetrahydrooctyl)- 1-dimethylchlorosilane on silicon oxide (silicon wafer) prepared using a rapid, solvent-free approach. Reaction conditions are 60 °C for 10 min using the neat (pure) compound, and no inert atmosphere or special treatment of the compound is required. |
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