Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS
Silane monolayers on silica, prepared from mono-, di-, and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di-and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon r...
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| المؤلف الرئيسي: | |
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| مؤلفون آخرون: | , , , |
| التنسيق: | article |
| منشور في: |
2002
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| الموضوعات: | |
| الوصول للمادة أونلاين: | http://hdl.handle.net/11073/21331 |
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| الملخص: | Silane monolayers on silica, prepared from mono-, di-, and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di-and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon reaction with water. Typically, an organic solvent is used when depositing a silane monolayer. Here we show XPS spectra of monolayers of ClSi(CH₃)₂(CH₂)₆CH=CH₂ (octenyldimethylchlorosilane, CAS# 17196-12-2) on silicon oxide (silicon wafer) prepared using a rapid, solvent-free approach. Reaction conditions are 120 °C for 10 min using the neat (pure) compound, and no inert atmosphere or special treatment of the compound is required. |
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