Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS
Silane monolayers on silica, prepared from mono-, di-, and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di-and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon r...
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| مؤلفون آخرون: | , , , |
| التنسيق: | article |
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2002
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| الوصول للمادة أونلاين: | http://hdl.handle.net/11073/21331 |
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| _version_ | 1864513436237430784 |
|---|---|
| author | Husseini, Ghaleb |
| author2 | Sathyapalan, Amarchand Sevy, Eric T. Linford, Matthew R. Asplund, Matthew C. |
| author2_role | author author author author |
| author_facet | Husseini, Ghaleb Sathyapalan, Amarchand Sevy, Eric T. Linford, Matthew R. Asplund, Matthew C. |
| author_role | author |
| dc.creator.none.fl_str_mv | Husseini, Ghaleb Sathyapalan, Amarchand Sevy, Eric T. Linford, Matthew R. Asplund, Matthew C. |
| dc.date.none.fl_str_mv | 2002 2021-03-04T05:51:55Z 2021-03-04T05:51:55Z |
| dc.format.none.fl_str_mv | application/pdf |
| dc.identifier.none.fl_str_mv | Husseini, G. A., Sathyapalan, A., Sevy, E. T., Linford, M. R., & Asplund, M. C. (2001). Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS. Surface Science Spectra, 8(4), 284-290. https://doi.org/10.1116/11.20020503 1055-5269 http://hdl.handle.net/11073/21331 10.1116/11.20020503 |
| dc.language.none.fl_str_mv | en_US |
| dc.publisher.none.fl_str_mv | American Vacuum Society |
| dc.relation.none.fl_str_mv | https://doi.org/10.1116/11.20020503 |
| dc.subject.none.fl_str_mv | X-ray photoelectron spectroscopy Silane Alkylation Monochlorosilanes |
| dc.title.none.fl_str_mv | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS |
| dc.type.none.fl_str_mv | Peer-Reviewed Published version info:eu-repo/semantics/publishedVersion info:eu-repo/semantics/article |
| description | Silane monolayers on silica, prepared from mono-, di-, and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di-and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon reaction with water. Typically, an organic solvent is used when depositing a silane monolayer. Here we show XPS spectra of monolayers of ClSi(CH₃)₂(CH₂)₆CH=CH₂ (octenyldimethylchlorosilane, CAS# 17196-12-2) on silicon oxide (silicon wafer) prepared using a rapid, solvent-free approach. Reaction conditions are 120 °C for 10 min using the neat (pure) compound, and no inert atmosphere or special treatment of the compound is required. |
| format | article |
| id | aus_60697087638cb37070f4b2ab576e8db3 |
| identifier_str_mv | Husseini, G. A., Sathyapalan, A., Sevy, E. T., Linford, M. R., & Asplund, M. C. (2001). Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS. Surface Science Spectra, 8(4), 284-290. https://doi.org/10.1116/11.20020503 1055-5269 10.1116/11.20020503 |
| language_invalid_str_mv | en_US |
| network_acronym_str | aus |
| network_name_str | aus |
| oai_identifier_str | oai:repository.aus.edu:11073/21331 |
| publishDate | 2002 |
| publisher.none.fl_str_mv | American Vacuum Society |
| repository.mail.fl_str_mv | |
| repository.name.fl_str_mv | |
| repository_id_str | |
| spelling | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPSHusseini, GhalebSathyapalan, AmarchandSevy, Eric T.Linford, Matthew R.Asplund, Matthew C.X-ray photoelectron spectroscopySilaneAlkylationMonochlorosilanesSilane monolayers on silica, prepared from mono-, di-, and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di-and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon reaction with water. Typically, an organic solvent is used when depositing a silane monolayer. Here we show XPS spectra of monolayers of ClSi(CH₃)₂(CH₂)₆CH=CH₂ (octenyldimethylchlorosilane, CAS# 17196-12-2) on silicon oxide (silicon wafer) prepared using a rapid, solvent-free approach. Reaction conditions are 120 °C for 10 min using the neat (pure) compound, and no inert atmosphere or special treatment of the compound is required.American Vacuum Society2021-03-04T05:51:55Z2021-03-04T05:51:55Z2002Peer-ReviewedPublished versioninfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfHusseini, G. A., Sathyapalan, A., Sevy, E. T., Linford, M. R., & Asplund, M. C. (2001). Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS. Surface Science Spectra, 8(4), 284-290. https://doi.org/10.1116/11.200205031055-5269http://hdl.handle.net/11073/2133110.1116/11.20020503en_UShttps://doi.org/10.1116/11.20020503oai:repository.aus.edu:11073/213312024-08-22T12:05:03Z |
| spellingShingle | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS Husseini, Ghaleb X-ray photoelectron spectroscopy Silane Alkylation Monochlorosilanes |
| status_str | publishedVersion |
| title | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS |
| title_full | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS |
| title_fullStr | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS |
| title_full_unstemmed | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS |
| title_short | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS |
| title_sort | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₆CH=CH₂ Analyzed by XPS |
| topic | X-ray photoelectron spectroscopy Silane Alkylation Monochlorosilanes |
| url | http://hdl.handle.net/11073/21331 |