Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS
Silane monolayers on silica, prepared from mono-, di- and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di- and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon r...
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| مؤلفون آخرون: | , , , |
| التنسيق: | article |
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2002
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| الوصول للمادة أونلاين: | http://hdl.handle.net/11073/21330 |
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| _version_ | 1864513432416419840 |
|---|---|
| author | Husseini, Ghaleb |
| author2 | Zilch, Lloyd W. Sevy, Eric T. Asplund, Matthew C. Linford, Matthew R. |
| author2_role | author author author author |
| author_facet | Husseini, Ghaleb Zilch, Lloyd W. Sevy, Eric T. Asplund, Matthew C. Linford, Matthew R. |
| author_role | author |
| dc.creator.none.fl_str_mv | Husseini, Ghaleb Zilch, Lloyd W. Sevy, Eric T. Asplund, Matthew C. Linford, Matthew R. |
| dc.date.none.fl_str_mv | 2002 2021-03-04T05:34:32Z 2021-03-04T05:34:32Z |
| dc.format.none.fl_str_mv | application/pdf |
| dc.identifier.none.fl_str_mv | Husseini, G. A., Zilch, L. W., Sevy, E. T., Asplund, M. C., & Linford, M. R. (2001). Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS. Surface Science Spectra, 8(4), 274-283. https://doi.org/10.1116/11.20020502 1055-5269 http://hdl.handle.net/11073/21330 10.1116/11.20020502 |
| dc.language.none.fl_str_mv | en_US |
| dc.publisher.none.fl_str_mv | American Vacuum Society |
| dc.relation.none.fl_str_mv | https://doi.org/10.1116/11.20020502 |
| dc.subject.none.fl_str_mv | X-ray photoelectron spectroscopy Silane Alkylation Monochlorosilanes |
| dc.title.none.fl_str_mv | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS |
| dc.type.none.fl_str_mv | Peer-Reviewed Published version info:eu-repo/semantics/publishedVersion info:eu-repo/semantics/article |
| description | Silane monolayers on silica, prepared from mono-, di- and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di- and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon reaction with water. Typically, an organic solvent is used when depositing a silane monolayer. Here we show XPS spectra of monolayers of ClSi(CH₃)₂(CH₂)₁₇CH₃ (octadecyldimethylchlorosilane, CAS# 18643-08-8) on silicon oxide (silicon wafer) prepared using a rapid, solvent-free approach. Reaction conditions are 120 °C for 10 min using the neat (pure) compound, and no inert atmosphere or special treatment of the compound is required. |
| format | article |
| id | aus_f91b2e567b0496b121f4abe9f9d685b9 |
| identifier_str_mv | Husseini, G. A., Zilch, L. W., Sevy, E. T., Asplund, M. C., & Linford, M. R. (2001). Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS. Surface Science Spectra, 8(4), 274-283. https://doi.org/10.1116/11.20020502 1055-5269 10.1116/11.20020502 |
| language_invalid_str_mv | en_US |
| network_acronym_str | aus |
| network_name_str | aus |
| oai_identifier_str | oai:repository.aus.edu:11073/21330 |
| publishDate | 2002 |
| publisher.none.fl_str_mv | American Vacuum Society |
| repository.mail.fl_str_mv | |
| repository.name.fl_str_mv | |
| repository_id_str | |
| spelling | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPSHusseini, GhalebZilch, Lloyd W.Sevy, Eric T.Asplund, Matthew C.Linford, Matthew R.X-ray photoelectron spectroscopySilaneAlkylationMonochlorosilanesSilane monolayers on silica, prepared from mono-, di- and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di- and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon reaction with water. Typically, an organic solvent is used when depositing a silane monolayer. Here we show XPS spectra of monolayers of ClSi(CH₃)₂(CH₂)₁₇CH₃ (octadecyldimethylchlorosilane, CAS# 18643-08-8) on silicon oxide (silicon wafer) prepared using a rapid, solvent-free approach. Reaction conditions are 120 °C for 10 min using the neat (pure) compound, and no inert atmosphere or special treatment of the compound is required.American Vacuum Society2021-03-04T05:34:32Z2021-03-04T05:34:32Z2002Peer-ReviewedPublished versioninfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfHusseini, G. A., Zilch, L. W., Sevy, E. T., Asplund, M. C., & Linford, M. R. (2001). Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS. Surface Science Spectra, 8(4), 274-283. https://doi.org/10.1116/11.200205021055-5269http://hdl.handle.net/11073/2133010.1116/11.20020502en_UShttps://doi.org/10.1116/11.20020502oai:repository.aus.edu:11073/213302024-08-22T12:04:14Z |
| spellingShingle | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS Husseini, Ghaleb X-ray photoelectron spectroscopy Silane Alkylation Monochlorosilanes |
| status_str | publishedVersion |
| title | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS |
| title_full | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS |
| title_fullStr | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS |
| title_full_unstemmed | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS |
| title_short | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS |
| title_sort | Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS |
| topic | X-ray photoelectron spectroscopy Silane Alkylation Monochlorosilanes |
| url | http://hdl.handle.net/11073/21330 |