بدائل البحث:
largest decrease » largest decreases (توسيع البحث), marked decrease (توسيع البحث)
larger decrease » marked decrease (توسيع البحث)
c largest » _ largest (توسيع البحث), c large (توسيع البحث)
n marked » _ marked (توسيع البحث), _ market (توسيع البحث), _ marker (توسيع البحث)
a marked » a marker (توسيع البحث), _ marked (توسيع البحث), a market (توسيع البحث)
c larger » _ larger (توسيع البحث), c large (توسيع البحث), _ large (توسيع البحث)
increase » increased (توسيع البحث)
largest decrease » largest decreases (توسيع البحث), marked decrease (توسيع البحث)
larger decrease » marked decrease (توسيع البحث)
c largest » _ largest (توسيع البحث), c large (توسيع البحث)
n marked » _ marked (توسيع البحث), _ market (توسيع البحث), _ marker (توسيع البحث)
a marked » a marker (توسيع البحث), _ marked (توسيع البحث), a market (توسيع البحث)
c larger » _ larger (توسيع البحث), c large (توسيع البحث), _ large (توسيع البحث)
increase » increased (توسيع البحث)
-
1
Deletion of Hhp2 markedly increased Sre1 activity.
منشور في 2020"…<p>Deletion of <i>hhp2</i><sup>+</sup> gene markedly increased Sre1 activity in the presence/absence of CLZ (2 μg/ml to 8 μg/ml) (A), TER (2 μg/ml to 8 μg/ml) (B) or CoCl<sub>2</sub> (0.08 mM to 0.32 mM) (C). …"
-
2
-
3
Changes during germination in % of amino acids with marked preferences at a particular position.
منشور في 2024الموضوعات: -
4
-
5
-
6
-
7
Increased phosphorylation of MARK2 occurs in the affected tissues of a mutant SOD1-induced ALS mouse model.
منشور في 2021"…The staining of phosphorylated MARK2-<sup>595</sup>T in all 3 brain regions is increased in the SOD1<sup>G93A</sup> mice as compared to NTg mice. …"
-
8
MARK2 is a direct kinase for eIF2α.
منشور في 2021"…Bar graph represents quantification of the immunoblot analysis (<i>n</i> = 3). (<b>E</b>) MEFs with elevated expression of MARK2<sup>WT</sup> showed significantly increased levels of phosphorylated eIF2α-<sup>51</sup>S, as compared to MEFs expressing the mutant MARK2<sup>T595A</sup>. …"
-
9
-
10
-
11
-
12
-
13
-
14
-
15
-
16
-
17
-
18
-
19
-
20
Optimized Deep Reactive-Ion Etching of Nanostructured Black Silicon for High-Contrast Optical Alignment Marks
منشور في 2021"…Our investigation of the process–structure–property relationships among the process etching, morphology evolution, and reflectance of n-BSi revealed that morphologies with an increased height, aspect ratio, and degree of tapering and a lower base spacing were most effective at suppressing reflection for λ = 500–800 nm. …"