Showing 1 - 20 results of 32,430 for search '(((( c largest decrease ) OR ( ((n marked) OR (a marked)) increase ))) OR ( i large decrease ))', query time: 0.77s Refine Results
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    Deletion of Hhp2 markedly increased Sre1 activity. by Hao Miao (1742044)

    Published 2020
    “…<p>Deletion of <i>hhp2</i><sup>+</sup> gene markedly increased Sre1 activity in the presence/absence of CLZ (2 μg/ml to 8 μg/ml) (A), TER (2 μg/ml to 8 μg/ml) (B) or CoCl<sub>2</sub> (0.08 mM to 0.32 mM) (C). …”
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    Increased phosphorylation of MARK2 occurs in the affected tissues of a mutant SOD1-induced ALS mouse model. by Yu-Ning Lu (10291271)

    Published 2021
    “…The staining of phosphorylated MARK2-<sup>595</sup>T in all 3 brain regions is increased in the SOD1<sup>G93A</sup> mice as compared to NTg mice. …”
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    MARK2 is a direct kinase for eIF2α. by Yu-Ning Lu (10291271)

    Published 2021
    “…Bar graph represents quantification of the immunoblot analysis (<i>n</i> = 3). (<b>E</b>) MEFs with elevated expression of MARK2<sup>WT</sup> showed significantly increased levels of phosphorylated eIF2α-<sup>51</sup>S, as compared to MEFs expressing the mutant MARK2<sup>T595A</sup>. …”
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    Simplified scheme illustrating the inhibitory effect of nNOS on the PPP during the initiation of GSIS. by Ingmar Lundquist (46422)

    Published 2025
    “…<p>1) A marked increase in glucose concentration results in a large accumulation of the released insulin at the exocytotic sites of nNOS-associated insulin granules (denoted as orange circles on insulin granules) in the PPP. …”
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    Deletion of microglial NKCC1 markedly impacts on baseline cell morphology and alters transformation to reactive microglia. by Krisztina Tóth (12009827)

    Published 2022
    “…(<b>B)</b> We generated a novel microglia-specific conditional NKCC1 KO transgenic mouse line by crossing NKCC1<sup>fl/fl</sup> (exon 8 of the <i>Slc12a2</i> gene was flanked with lox P sites) and Cx3CR1-Cre<sup>ERT2</sup> mice. …”
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    Optimized Deep Reactive-Ion Etching of Nanostructured Black Silicon for High-Contrast Optical Alignment Marks by Maha Yusuf (11127378)

    Published 2021
    “…Our investigation of the process–structure–property relationships among the process etching, morphology evolution, and reflectance of n-BSi revealed that morphologies with an increased height, aspect ratio, and degree of tapering and a lower base spacing were most effective at suppressing reflection for λ = 500–800 nm. …”
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