Microscopic Mechanisms of Reaction-Coupled Acid Diffusion in Chemically Amplified Photoresists

Microscopic Mechanisms of Reaction-Coupled Acid Diffusion in Chemically Amplified Photoresists

Diffusion in photoresists is a fundamental process that significantly impacts micro-nano manufacturing. However, it often intertwines with chemical reactions, leading to intricate kinetics that compounds our comprehension. Here, we successfully applied all-atom molecular dynamics simulations to simu...

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Bibliographic Details
Main Author: Zilin Wang (1936828) (author)
Other Authors: Hong Du (117108) (author), Hanshen Xin (6633821) (author), Jie Xue (417504) (author), Jianhua Zhang (6347) (author), Haoyuan Li (1801717) (author)
Published: 2024
Subjects:
Biophysics
Biochemistry
Medicine
Developmental Biology
Inorganic Chemistry
Infectious Diseases
Computational Biology
Biological Sciences not elsewhere classified
Chemical Sciences not elsewhere classified
Information Systems not elsewhere classified
significantly impacts micro
advancing photoresist design
coupled acid diffusion
extreme ultraviolet photoresists
experimental reaction dynamics
simultaneously describing diffusion
simultaneously describe
theoretical reference
successfully applied
species present
resolution patterning
organic solids
organic matrix
organic electrolytes
often intertwines
nano manufacturing
molecular modeling
microscopic mechanisms
level simulations
ion transport
intricate kinetics
insights broaden
higher performances
fundamental process
deprotection reactions
critical materials
chemical reactions
binding sites
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