Substrate-Independent and Antisolvent-Free Fabrication Method for Tin Perovskite Films via Imidazole-Complexed Intermediates

Substrate-Independent and Antisolvent-Free Fabrication Method for Tin Perovskite Films via Imidazole-Complexed Intermediates

The fabrication of metal halide perovskite thin films, particularly those containing Sn, relies heavily on the use of antisolvents. Film quality is strongly influenced by factors such as the choice of antisolvent, the primary precursor solvent, perovskite composition, and the size and wettability of...

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Bibliographic Details
Main Author: Fuyuki Harata (14193285) (author)
Other Authors: Ryuji Kaneko (4350730) (author), Shuaifeng Hu (6243320) (author), Noboru Ohashi (4338331) (author), Tomoya Nakamura (354540) (author), Minh Anh Truong (1478800) (author), Richard Murdey (2526541) (author), Atsushi Wakamiya (1453144) (author)
Published: 2025
Subjects:
Biophysics
Biochemistry
Microbiology
Ecology
Space Science
Chemical Sciences not elsewhere classified
Physical Sciences not elsewhere classified
vinylimidazole )] complex
primary precursor solvent
dmso )- free
crystal growth regulator
intermediate films containing
diverse perovskite compositions
assisted fabrication process
allowing device fabrication
2 </ sup
free fabrication method
5 × 7
perovskite composition
containing sn
5 cm
transporting monolayers
strongly influenced
relies heavily
pscs ).
hydrophobic hole
film quality
dimethyl sulfoxide
complexed intermediates
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