Supplemental Information
Supplemental Information
Gorde:
| Egile nagusia: | |
|---|---|
| Beste egile batzuk: | , , , , , |
| Argitaratua: |
2025
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| Gaiak: | |
| Etiketak: |
Etiketa erantsi
Etiketarik gabe, Izan zaitez lehena erregistro honi etiketa jartzen!
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| _version_ | 1851485271240998912 |
|---|---|
| author | Yi Chen (38576) |
| author2 | Daniel Cho (6813263) John Hoang (4244698) Nick Altieri (21377180) Ji Zhu (106734) Samantha Tan (21377183) Jane Chang (446866) |
| author2_role | author author author author author author |
| author_facet | Yi Chen (38576) Daniel Cho (6813263) John Hoang (4244698) Nick Altieri (21377180) Ji Zhu (106734) Samantha Tan (21377183) Jane Chang (446866) |
| author_role | author |
| dc.creator.none.fl_str_mv | Yi Chen (38576) Daniel Cho (6813263) John Hoang (4244698) Nick Altieri (21377180) Ji Zhu (106734) Samantha Tan (21377183) Jane Chang (446866) |
| dc.date.none.fl_str_mv | 2025-06-20T04:08:28Z |
| dc.identifier.none.fl_str_mv | 10.60893/figshare.jva.29089895.v1 |
| dc.relation.none.fl_str_mv | https://figshare.com/articles/dataset/Supplemental_Information/29089895 |
| dc.rights.none.fl_str_mv | CC BY-NC 4.0 info:eu-repo/semantics/openAccess |
| dc.subject.none.fl_str_mv | Chemical sciences Thermal etch Selective SiGe etch Kinetics model |
| dc.title.none.fl_str_mv | Supplemental Information |
| dc.type.none.fl_str_mv | Dataset info:eu-repo/semantics/publishedVersion dataset |
| description | Supplemental Information |
| eu_rights_str_mv | openAccess |
| id | Manara_e3f0833e65f6548d2f71ac9f4f20db3a |
| identifier_str_mv | 10.60893/figshare.jva.29089895.v1 |
| network_acronym_str | Manara |
| network_name_str | ManaraRepo |
| oai_identifier_str | oai:figshare.com:article/29089895 |
| publishDate | 2025 |
| repository.mail.fl_str_mv | |
| repository.name.fl_str_mv | |
| repository_id_str | |
| rights_invalid_str_mv | CC BY-NC 4.0 |
| spelling | Supplemental InformationYi Chen (38576)Daniel Cho (6813263)John Hoang (4244698)Nick Altieri (21377180)Ji Zhu (106734)Samantha Tan (21377183)Jane Chang (446866)Chemical sciencesThermal etchSelective SiGe etchKinetics modelSupplemental Information2025-06-20T04:08:28ZDatasetinfo:eu-repo/semantics/publishedVersiondataset10.60893/figshare.jva.29089895.v1https://figshare.com/articles/dataset/Supplemental_Information/29089895CC BY-NC 4.0info:eu-repo/semantics/openAccessoai:figshare.com:article/290898952025-06-20T04:08:28Z |
| spellingShingle | Supplemental Information Yi Chen (38576) Chemical sciences Thermal etch Selective SiGe etch Kinetics model |
| status_str | publishedVersion |
| title | Supplemental Information |
| title_full | Supplemental Information |
| title_fullStr | Supplemental Information |
| title_full_unstemmed | Supplemental Information |
| title_short | Supplemental Information |
| title_sort | Supplemental Information |
| topic | Chemical sciences Thermal etch Selective SiGe etch Kinetics model |