Supplemental Information

Supplemental Information

Supplemental Information

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Bibliographic Details
Main Author:	Yi Chen (38576) (author)
Other Authors:	Daniel Cho (6813263) (author), John Hoang (4244698) (author), Nick Altieri (21377180) (author), Ji Zhu (106734) (author), Samantha Tan (21377183) (author), Jane Chang (446866) (author)
Published:	2025
Subjects:	Chemical sciences Thermal etch Selective SiGe etch Kinetics model
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