Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS
Monolayers of trichloro(lH,1H,2H,2H-perfluorooctyl)silane, Cl3SiCH2CH2(CF2)5CF3, were deposited via chemical vapor deposition onto the native oxide layer on silicon after plasma-cleaning. The samples have high hydrophobicity, and provide a valuable comparison to perfluorinated alkyl silane layers ob...
محفوظ في:
| المؤلف الرئيسي: | |
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| مؤلفون آخرون: | , , |
| التنسيق: | article |
| منشور في: |
2012
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| الموضوعات: | |
| الوصول للمادة أونلاين: | http://hdl.handle.net/11073/21342 |
| الوسوم: |
إضافة وسم
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| _version_ | 1864513438859919360 |
|---|---|
| author | Lee, Michael V. |
| author2 | Husseini, Ghaleb Sautter, Ken Linford, Matthew R. |
| author2_role | author author author |
| author_facet | Lee, Michael V. Husseini, Ghaleb Sautter, Ken Linford, Matthew R. |
| author_role | author |
| dc.creator.none.fl_str_mv | Lee, Michael V. Husseini, Ghaleb Sautter, Ken Linford, Matthew R. |
| dc.date.none.fl_str_mv | 2012 2021-03-04T07:53:01Z 2021-03-04T07:53:01Z |
| dc.format.none.fl_str_mv | application/pdf |
| dc.identifier.none.fl_str_mv | Lee, M. V., Husseini, G., Sautter, K., & Linford, M. R. (2010). Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS. Surface Science Spectra, 17(1), 87-92. https://doi.org/10.1116/11.20071103 1055-5269 http://hdl.handle.net/11073/21342 10.1116/11.20071103 |
| dc.language.none.fl_str_mv | en_US |
| dc.publisher.none.fl_str_mv | American Vacuum Society |
| dc.relation.none.fl_str_mv | https://doi.org/10.1116/11.20071103 |
| dc.subject.none.fl_str_mv | Perfluorinated silane Gas-phase Native silicon dioxide |
| dc.title.none.fl_str_mv | Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS |
| dc.type.none.fl_str_mv | Peer-Reviewed Published version info:eu-repo/semantics/publishedVersion info:eu-repo/semantics/article |
| description | Monolayers of trichloro(lH,1H,2H,2H-perfluorooctyl)silane, Cl3SiCH2CH2(CF2)5CF3, were deposited via chemical vapor deposition onto the native oxide layer on silicon after plasma-cleaning. The samples have high hydrophobicity, and provide a valuable comparison to perfluorinated alkyl silane layers obtained by liquid deposition. Gas-phase deposition of perfluorinated alkyl silanes is a useful means for reducing stiction in micro- and nano-electromechanical systems, which have narrow spaces that can trap bubbles and prevent liquid-based silane passivation. |
| format | article |
| id | aus_533471e893f77725fc181f08cdf1471d |
| identifier_str_mv | Lee, M. V., Husseini, G., Sautter, K., & Linford, M. R. (2010). Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS. Surface Science Spectra, 17(1), 87-92. https://doi.org/10.1116/11.20071103 1055-5269 10.1116/11.20071103 |
| language_invalid_str_mv | en_US |
| network_acronym_str | aus |
| network_name_str | aus |
| oai_identifier_str | oai:repository.aus.edu:11073/21342 |
| publishDate | 2012 |
| publisher.none.fl_str_mv | American Vacuum Society |
| repository.mail.fl_str_mv | |
| repository.name.fl_str_mv | |
| repository_id_str | |
| spelling | Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPSLee, Michael V.Husseini, GhalebSautter, KenLinford, Matthew R.Perfluorinated silaneGas-phaseNative silicon dioxideMonolayers of trichloro(lH,1H,2H,2H-perfluorooctyl)silane, Cl3SiCH2CH2(CF2)5CF3, were deposited via chemical vapor deposition onto the native oxide layer on silicon after plasma-cleaning. The samples have high hydrophobicity, and provide a valuable comparison to perfluorinated alkyl silane layers obtained by liquid deposition. Gas-phase deposition of perfluorinated alkyl silanes is a useful means for reducing stiction in micro- and nano-electromechanical systems, which have narrow spaces that can trap bubbles and prevent liquid-based silane passivation.American Vacuum Society2021-03-04T07:53:01Z2021-03-04T07:53:01Z2012Peer-ReviewedPublished versioninfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfLee, M. V., Husseini, G., Sautter, K., & Linford, M. R. (2010). Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS. Surface Science Spectra, 17(1), 87-92. https://doi.org/10.1116/11.200711031055-5269http://hdl.handle.net/11073/2134210.1116/11.20071103en_UShttps://doi.org/10.1116/11.20071103oai:repository.aus.edu:11073/213422024-08-22T12:03:58Z |
| spellingShingle | Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS Lee, Michael V. Perfluorinated silane Gas-phase Native silicon dioxide |
| status_str | publishedVersion |
| title | Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS |
| title_full | Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS |
| title_fullStr | Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS |
| title_full_unstemmed | Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS |
| title_short | Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS |
| title_sort | Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS |
| topic | Perfluorinated silane Gas-phase Native silicon dioxide |
| url | http://hdl.handle.net/11073/21342 |