Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS
Monolayers of trichloro(lH,1H,2H,2H-perfluorooctyl)silane, Cl3SiCH2CH2(CF2)5CF3, were deposited via chemical vapor deposition onto the native oxide layer on silicon after plasma-cleaning. The samples have high hydrophobicity, and provide a valuable comparison to perfluorinated alkyl silane layers ob...
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| Format: | article |
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2012
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| Online Access: | http://hdl.handle.net/11073/21342 |
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