Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition
A self-aligned thin-film deposition technique was developed to mechanically attach carbon nanotubes to surfaces for the fabrication of structurally robust nanotube-based nanomechanical devices. Single-walled carbon nanotubes were grown by thermal chemical-vapor deposition (CVD) across 150-nm-wide SiO...
محفوظ في:
| المؤلف الرئيسي: | |
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| مؤلفون آخرون: | , , , |
| التنسيق: | article |
| منشور في: |
2003
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| الموضوعات: | |
| الوصول للمادة أونلاين: | http://hdl.handle.net/11073/20685 |
| الوسوم: |
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| _version_ | 1864513438856773632 |
|---|---|
| author | Whittaker, Jed D. |
| author2 | Brink, Markus Husseini, Ghaleb Linford, Matthew R. Davis, Robert C. |
| author2_role | author author author author |
| author_facet | Whittaker, Jed D. Brink, Markus Husseini, Ghaleb Linford, Matthew R. Davis, Robert C. |
| author_role | author |
| dc.creator.none.fl_str_mv | Whittaker, Jed D. Brink, Markus Husseini, Ghaleb Linford, Matthew R. Davis, Robert C. |
| dc.date.none.fl_str_mv | 2003 2021-01-13T07:41:40Z 2021-01-13T07:41:40Z |
| dc.format.none.fl_str_mv | application/pdf |
| dc.identifier.none.fl_str_mv | Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition, Jed D. Whittaker, Markus Brink ,Ghaleb A. Husseini and Matthew R. Linford, Robert C. Davis, Applied Physics Letters, 83, 5307-5309 (2003) https://doi.org/10.1063/1.1636267 1077-3118 http://hdl.handle.net/11073/20685 10.1063/1.1636267 |
| dc.language.none.fl_str_mv | en_US |
| dc.publisher.none.fl_str_mv | American Institute of Physics (AIP) |
| dc.relation.none.fl_str_mv | https://doi.org/10.1063/1.1636267 |
| dc.subject.none.fl_str_mv | Metal oxides Silicates Chemical vapor deposition Chemical elements Thin film deposition Nanotubes |
| dc.title.none.fl_str_mv | Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition |
| dc.type.none.fl_str_mv | Peer-Reviewed Published version info:eu-repo/semantics/publishedVersion info:eu-repo/semantics/article |
| description | A self-aligned thin-film deposition technique was developed to mechanically attach carbon nanotubes to surfaces for the fabrication of structurally robust nanotube-based nanomechanical devices. Single-walled carbon nanotubes were grown by thermal chemical-vapor deposition (CVD) across 150-nm-wide SiO2 trenches. The nanotubes were mechanically attached to the trench tops by selective silicon tetraacetate-based SiO2 CVD. No film was deposited on the nanotubes where they were suspended across the trenches. |
| format | article |
| id | aus_7a661e76fc115e66d9589b757bc4377e |
| identifier_str_mv | Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition, Jed D. Whittaker, Markus Brink ,Ghaleb A. Husseini and Matthew R. Linford, Robert C. Davis, Applied Physics Letters, 83, 5307-5309 (2003) https://doi.org/10.1063/1.1636267 1077-3118 10.1063/1.1636267 |
| language_invalid_str_mv | en_US |
| network_acronym_str | aus |
| network_name_str | aus |
| oai_identifier_str | oai:repository.aus.edu:11073/20685 |
| publishDate | 2003 |
| publisher.none.fl_str_mv | American Institute of Physics (AIP) |
| repository.mail.fl_str_mv | |
| repository.name.fl_str_mv | |
| repository_id_str | |
| spelling | Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor depositionWhittaker, Jed D.Brink, MarkusHusseini, GhalebLinford, Matthew R.Davis, Robert C.Metal oxidesSilicatesChemical vapor depositionChemical elementsThin film depositionNanotubesA self-aligned thin-film deposition technique was developed to mechanically attach carbon nanotubes to surfaces for the fabrication of structurally robust nanotube-based nanomechanical devices. Single-walled carbon nanotubes were grown by thermal chemical-vapor deposition (CVD) across 150-nm-wide SiO2 trenches. The nanotubes were mechanically attached to the trench tops by selective silicon tetraacetate-based SiO2 CVD. No film was deposited on the nanotubes where they were suspended across the trenches.American Institute of Physics (AIP)2021-01-13T07:41:40Z2021-01-13T07:41:40Z2003Peer-ReviewedPublished versioninfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfSelf-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition, Jed D. Whittaker, Markus Brink ,Ghaleb A. Husseini and Matthew R. Linford, Robert C. Davis, Applied Physics Letters, 83, 5307-5309 (2003) https://doi.org/10.1063/1.16362671077-3118http://hdl.handle.net/11073/2068510.1063/1.1636267en_UShttps://doi.org/10.1063/1.1636267oai:repository.aus.edu:11073/206852024-08-22T12:03:57Z |
| spellingShingle | Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition Whittaker, Jed D. Metal oxides Silicates Chemical vapor deposition Chemical elements Thin film deposition Nanotubes |
| status_str | publishedVersion |
| title | Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition |
| title_full | Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition |
| title_fullStr | Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition |
| title_full_unstemmed | Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition |
| title_short | Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition |
| title_sort | Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition |
| topic | Metal oxides Silicates Chemical vapor deposition Chemical elements Thin film deposition Nanotubes |
| url | http://hdl.handle.net/11073/20685 |